Helen Maynard - Concepedia

Author

Helen Maynard

University of Wisconsin–Madison

Also Known As

H. L. Maynard, H. Maynard, H.L. Maynard, Helen L. Maynard, Helen Maynard

Publications

819

Citations

H-Index

Concepts

All Affiliations

University of Wisconsin–Madison Applied Materials (United States)

About

Helen Maynard is an author at University of Wisconsin–Madison specializing in engineering, microelectronics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	16	758
2	Applied Physics	10	11	368
3	Natural Sciences	2	2	99
4	Medicine	1	1	18
5	Chemical Engineering	1	1	128

Helen Maynard

Publications

758

Citations

H-Index

Page 1

	Year	Citations
Design considerations for miniaturized PEM fuel cells Jeremy P. Meyers, Helen Maynard Journal of Power Sources Electrical EngineeringEngineeringEnergy EfficiencyEnergy ConversionPem Fuel Cells	2002	209
Miniature fuel cells for portable power: Design considerations and challenges Helen Maynard, Jeremy P. Meyers Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringEnergy EfficiencyEnergy ConversionBiofuel CellPower Electronics	2002	128
The Vertical Replacement-Gate (VRG) MOSFET: a 50-nm vertical MOSFET with lithography-independent gate length J. M. Hergenrother, D. Monroe, F. Klemens, Lithography-independent Gate LengthAdvanced Planar MosfetsElectrical EngineeringEngineeringVlsi Design	2003	91
Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma Ji Cheng Ding, J.-S. Jenq, Gon‐Ho Kim, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Rate CharacterizationCritical ValueEngineeringPhysicsMicrofabrication	1993	73
Investigation of CVD SiCOH low-k time-dependent dielectric breakdown at 65nm node technology F. Chen, Kaushik Chanda, Inderbir S. Gill, Materials ScienceTddb DegradationElectrical EngineeringEngineeringNode Technology	2005	42
Ultra-low NMOS contact resistivity using a novel plasma-based DSS implant and laser anneal for post 7 nm nodes Chi‐Nung Ni, K. V. Rao, Fareen Adeni Khaja, EngineeringLaser AnnealOptoelectronic DevicesPost 7Silicon On Insulator	2016	39
Plasma etching of submicron devices: in situ monitoring and control by multi-wavelength ellipsometry Helen Maynard, N. Layadi, J.T.C. Lee Thin Solid Films EngineeringElectron-beam LithographyPhysicsMicrofabricationBeam Lithography	1998	32
Multiwavelength ellipsometry for real-time process control of the plasma etching of patterned samples Helen Maynard, N. Layadi, John Tseng-Chung Lee Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyReal-time ThicknessPlasma Processing	1997	26
Control of the radio-frequency wave form at the chuck of an industrial oxide-etch reactor L.A. Berry, Helen Maynard, Paul Miller, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Electrical EngineeringIndustrial ReactorsEngineeringPlasma ElectronicsRadio Frequency	2000	19
Plasma characterization and process control diagnostics N. Hershkowitz, Helen Maynard Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringMeasurementDiagnosisPlasma ProcessingPlasma Characterization	1993	18

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