Concepedia

Ahila Krishnamoorthy

AK

Statistics

Publications

22

Citations

775

H-Index

16

Active since

2000

Affiliations

Institute of Microelectronics(Current)

Singapore Science Park

Nanyang Technological University

National University of Singapore

University of California, Los Angeles

Ahila Krishnamoorthy is an author at Institute of Microelectronics specializing in materials science, electronic materials, and engineering.

Publications per year

2000–2010

22

Publications

22

Self-assembled near-zero-thickness molecular layers as diffusion barriers for Cu metallization

Ahila Krishnamoorthy, K. Chanda, S. P. Murarka et al. · Applied Physics Letters · 2001 · 114 citations

Engineering, Materials Engineering, Materials Science +17

<i>In situ</i> observation of electromigration-induced void migration in dual-damascene Cu interconnect structures

A. V. Vairagar, Subodh G. Mhaisalkar, Ahila Krishnamoorthy et al. · Applied Physics Letters · 2004 · 107 citations

Natural Sciences, Electrical Engineering, Materials Science +13

Electromigration behavior of dual-damascene Cu interconnects––Structure, width, and length dependences

A. V. Vairagar, Subodh G. Mhaisalkar, Ahila Krishnamoorthy · Microelectronics Reliability · 2004 · 79 citations

Engineering, Electrical Engineering, Materials Science +17

Investigation of electrical conduction in carbon-doped silicon oxide using a voltage ramp method

Kok-Yong Yiang, Won Jong Yoo, Qiang Guo et al. · Applied Physics Letters · 2003 · 62 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Current crowding effect on copper dual damascene via bottom failure for ULSI applications

Cher Ming Tan, Arijit Roy, A. V. Vairagar et al. · IEEE Transactions on Device and Materials Reliability · 2005 · 57 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

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