A. V. Vairagar

Statistics

Publications

Citations

516

H-Index

Active since

2004

Affiliations

Nanyang Technological University(Current)

Institute of Microelectronics

University of California, Los Angeles

Singapore Science Park

Semiconductor Manufacturing International (Italy)

A. V. Vairagar is an author at Nanyang Technological University specializing in interconnect technology, copper interconnects, and electromigration analysis.

Publications per year

2004–2009

Publications

<i>In situ</i> observation of electromigration-induced void migration in dual-damascene Cu interconnect structures

A. V. Vairagar, Subodh G. Mhaisalkar, Ahila Krishnamoorthy et al. · Applied Physics Letters · 2004 · 107 citations

Natural Sciences, Electrical Engineering, Materials Science +13

Electromigration behavior of dual-damascene Cu interconnects––Structure, width, and length dependences

A. V. Vairagar, Subodh G. Mhaisalkar, Ahila Krishnamoorthy · Microelectronics Reliability · 2004 · 79 citations

Engineering, Electrical Engineering, Materials Science +17

Current crowding effect on copper dual damascene via bottom failure for ULSI applications

Cher Ming Tan, Arijit Roy, A. V. Vairagar et al. · IEEE Transactions on Device and Materials Reliability · 2005 · 57 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Direct evidence of electromigration failure mechanism in dual-damascene Cu interconnect tree structures

A. V. Vairagar, Subodh G. Mhaisalkar, Michael Meyer et al. · Applied Physics Letters · 2005 · 33 citations

Engineering, Electrical Engineering, Materials Science +17

Effect of surface treatment on electromigration in sub-micron Cu damascene interconnects

A. V. Vairagar, Subodh G. Mhaisalkar, Ahila Krishnamoorthy · Thin Solid Films · 2004 · 31 citations

Engineering, Electrical Engineering, Materials Engineering +14

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