O. Beldarrain

Deposition Temperature and Thermal Annealing Effects on the Electrical Characteristics of Atomic Layer Deposited Al2O3 Films on Silicon

J.M. Rafı́, M. Zabala, O. Beldarrain et al. · Journal of The Electrochemical Society · 2011 · 59 citations · Full text

Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

F. Campabadal, J.M. Rafı́, M. Zabala et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 56 citations

Engineering, Metal-insulator-semiconductor Structures, Silicon On Insulator +17

Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

H. García, Helena Castán, S. Dueñas et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 29 citations

Engineering, Chemistry, Atomic-layer-deposited Hafnium +24

Blistering of atomic layer deposition Al2O3 layers grown on silicon and its effect on metal–insulator–semiconductor structures

O. Beldarrain, Marta Duch, M. Zabala et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 27 citations

Engineering, Thin Film Process Technology, Chemical Deposition +16

2 MeV electron irradiation effects on the electrical characteristics of metal–oxide–silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics

J.M. Rafı́, F. Campabadal, H. Ohyama et al. · Solid-State Electronics · 2012 · 26 citations

Materials Science, Electrical Characteristics, Electrical Engineering +9