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2 MeV electron irradiation effects on the electrical characteristics of metal–oxide–silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics

Materials ScienceElectrical CharacteristicsElectrical EngineeringIon ImplantationEngineeringMetal–oxide–silicon CapacitorsNanoelectronicsOxide ElectronicsApplied PhysicsMicroelectronicsAtomic LayerElectrical Insulation