J. W. Lee

High-density plasma etching of compound semiconductors

R. J. Shul, G McClellan, R. D. Briggs et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 122 citations

Engineering, Materials Engineering, Materials Science +17

Wet Chemical Etching of AlN and InAlN in KOH Solutions

C. B. Vartuli, S. J. Pearton, J. W. Lee et al. · Journal of The Electrochemical Society · 1996 · 54 citations

Engineering, Materials Engineering, Materials Science +17

Copper Dry Etching with Cl2 / Ar Plasma Chemistry

J. W. Lee, Y. D. Park, J. R. Childress et al. · Journal of The Electrochemical Society · 1998 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +16

Chlorine-Based Plasma Etching of GaN

R. J. Shul, R. D. Briggs, S. J. Pearton et al. · MRS Proceedings · 1996 · 32 citations

Engineering, Materials Engineering, Materials Science +12

Reactive ion beam etching of GaAs and related compounds in an inductively coupled plasma of Cl2–Ar mixture

Yoon‐Bong Hahn, J. W. Lee, G.A. Vawter et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 23 citations · Full text

Engineering, Materials Engineering, Materials Science +17