Concepedia

Alexandra McClelland

AM

9

Publications

113

Citations

9

H-Index

2013

Active since

Affiliations

University of Birmingham(Current)

Nano-C (United States)

Paul Scherrer Institute

University of Leeds

Alexandra McClelland is an author at University of Birmingham specializing in microelectronics, engineering, and applied physics.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMicroelectronicsOptoelectronicsMicrofabricationChemistryPhotochemistryInstrumentationSurface Science

Publications per year

2013–2018

9

Publications

9

Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography

Carmen Popescu, Andreas Frommhold, Alexandra McClelland et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 17 citations · Full text

Short Wavelength Optic, Engineering, Electron-beam Lithography +21

Multi Trigger Resist for EUV Lithography

Carmen Popescu, Yannick Vesters, Alexandra McClelland et al. · Journal of Photopolymer Science and Technology · 2018 · 14 citations · Full text

Engineering, Electron-beam Lithography, Target Fabrication +16

Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography

Andreas Frommhold, Dongxu Yang, Alexandra McClelland et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 13 citations · Full text

Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography

Andreas Frommhold, Dongxu Yang, Alexandra McClelland et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 13 citations · Full text

High-resolution EUV lithography using a multi-trigger resist

Alex P. G. Robinson, Carmen Popescu, Dimitrios Kazazis et al. · 2018 · 13 citations · Full text

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