Rolf Seltmann

The use of EUV lithography to produce demonstration devices

Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 42 citations

Deformable micromirror devices as phase-modulating high-resolution light valves

H. Kück, Wolfgang Doleschal, Andreas Gehner et al. · Sensors and Actuators A Physical · 1996 · 27 citations

Photonics, Engineering, Microfabrication +4

Role of 3D photo-resist simulation for advanced technology nodes

Aravind Narayana Samy, Rolf Seltmann, Frank Kahlenberg et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 14 citations

Engineering, Resist Model Portability, Electron-beam Lithography +21

New system for fast submicron optical direct writing

Rolf Seltmann, Wolfgang Doleschal, Andreas Gehner et al. · Microelectronic Engineering · 1996 · 13 citations

Photonics, Optical Materials, Engineering +7

Meeting overlay requirements for future technology nodes with in-die overlay metrology

Bernd Schulz, Rolf Seltmann, Jens Busch et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 10 citations

Future Technology Nodes, Physical Design (Electronics), Engineering +15