H. Kokura

Plasma Absorption Probe for Measuring Electron Density in an Environment Soiled with Processing Plasmas

H. Kokura, Keiji Nakamura, I. Ghanashev et al. · Japanese Journal of Applied Physics · 1999 · 200 citations

Processing Plasmas, Electron Density, Electrical Engineering +14

Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma

H. Kokura, Keiji Nakamura, N. Mitsuhira et al. · Japanese Journal of Applied Physics · 1999 · 82 citations

Same Electron Density, Electrical Engineering, Inductive Rf Plasma +14

Technology booster using strain-enhancing laminated SiN (SELS) for 65nm node HP MPUs

Ken Goto, Shuichi Satoh, Hiromichi Ohta et al. · 2005 · 31 citations

Materials Engineering, Electrical Engineering, Technology Booster +13

High performance 30 nm gate bulk CMOS for 45 nm node with σ-shaped SiGe-SD

Hiromichi Ohta, Y. Kim, Y. Shimamune et al. · 2006 · 26 citations

Electrical Engineering, Engineering, Vlsi Design +15

High performance 25 nm gate CMOSFETs for 65 nm node high speed MPUs

Kenichi Gotō, Y. Tagawa, Hiromichi Ohta et al. · 2004 · 22 citations

Low-power Electronics, Electrical Engineering, Engineering +13