Spyridon Skordas

Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET

N. Loubet, Terence B. Hook, P. Montanini et al. · 2017 · 939 citations

Engineering, Nanocomputing, Semiconductor Device +17

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 139 citations

Engineering, Electron-beam Lithography, Finfet Technology +18

Study of the electronic structure of TiO2(110) and Cs/TiO2(110) with metastable impact electron spectroscopy and ultraviolet photoemission spectroscopy (HeI)

M. Brause, Spyridon Skordas, V. Kempter · Surface Science · 2000 · 46 citations

Materials Science, Engineering, Inorganic Photochemistry +6

Three-Dimensional Wafer Stacking Using Cu TSV Integrated with 45 nm High Performance SOI-CMOS Embedded DRAM Technology

Pooja Batra, Spyridon Skordas, D. LaTulipe et al. · Journal of Low Power Electronics and Applications · 2014 · 19 citations · Full text

Engineering, Integrated Circuits, Interconnect (Integrated Circuits) +16

Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications

Filippos Papadatos, Steven Consiglio, Spyridon Skordas et al. · Journal of materials research/Pratt's guide to venture capital sources · 2004 · 15 citations

Electrical Engineering, Engineering, Oxide Electronics +7