Cherry Tang

Characterizing post-exposure bake processing for transient- and steady-state conditions in the context of critical dimension control

David A. Steele, Anthony Coniglio, Cherry Tang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 32 citations

Engineering, Electron-beam Lithography, Industrial Engineering +24

Comprehensive CD uniformity control across lithography and etch

Qiaolin Zhang, Cherry Tang, Tony Hsieh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 15 citations

Electrical Engineering, Physical Design (Electronics), Engineering +13

Across-wafer CD uniformity control through lithography and etch process: experimental verification

Qiaolin Zhang, Cherry Tang, Jason P. Cain et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 15 citations

Experimental Verification, Engineering, Electron-beam Lithography +22

Time-based PEB adjustment for optimizing CD distributions

Paul Friedberg, Cherry Tang, Bhanwar Singh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 14 citations

Mathematical Programming, Engineering, Steady State Sector +16