Concepedia
Statistics
Publications
22
Citations
577
H-Index
16
Active since
2003
Affiliations
The University of Osaka(Current)
Nagoya University
Toshiba (Japan)
Karlsruhe Institute of Technology
Kazunori Nagahata is an author at The University of Osaka specializing in engineering, applied physics, and materials science.
Top concepts
EngineeringApplied PhysicsMaterial ScienceSurface ScienceMaterials EngineeringMicroelectronicsChemical EngineeringNanoelectronicsChemistryElectrical Engineering
Publications per year
2003–2018
Plasma damage mechanisms for low-k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process
Saburo Uchida, Seigo Takashima, Masaru Hori et al. · Journal of Applied Physics · 2008 · 139 citations
Materials Science, Materials Engineering, Electrical Engineering +15
Characterization of polymer layer formation during SiO<sub>2</sub>/SiN etching by fluoro/hydrofluorocarbon plasmas
Keita Miyake, Tomoko Ito, Michiro Isobe et al. · Japanese Journal of Applied Physics · 2014 · 47 citations
Materials Science, Fluoro/hydrofluorocarbon Plasmas, Engineering +13
Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists
Keigo Takeda, Yudai Miyawaki, Seigo Takashima et al. · Journal of Applied Physics · 2011 · 40 citations
Materials Science, Materials Engineering, Chemical Engineering +15
Prediction of Fluctuations in Plasma–Wall Interactions Using an Equipment Engineering System
Masanaga Fukasawa, Atsushi Kawashima, Nobuyuki Kuboi et al. · Japanese Journal of Applied Physics · 2009 · 39 citations
Excess Deposition, Engineering, Etch Rate +13
Evaluation of Property Changes due to Radiation, Radicals, and Ions on Organic Low-k Films in H<sub>2</sub>/N<sub>2</sub> Plasma Etching
Saburo Uchida, Seigo Takashima, Masaru Hori et al. · Japanese Journal of Applied Physics · 2008 · 25 citations
Engineering, Par Film, Property Changes +18
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