Concepedia

Michiro Isobe

MI

Statistics

Publications

17

Citations

316

H-Index

14

Active since

1994

Affiliations

The University of Osaka(Current)

Tokyo Electron (Japan)

Michiro Isobe is an author at The University of Osaka specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMicroelectronicsChemistryNanotechnologyMaterial ScienceNanoelectronicsMicrofabricationPhysics

Publications per year

1994–2023

17

Publications

17

Characterization of polymer layer formation during SiO<sub>2</sub>/SiN etching by fluoro/hydrofluorocarbon plasmas

Keita Miyake, Tomoko Ito, Michiro Isobe et al. · Japanese Journal of Applied Physics · 2014 · 47 citations

Materials Science, Fluoro/hydrofluorocarbon Plasmas, Engineering +13

Surface damage formation during atomic layer etching of silicon with chlorine adsorption

Erin Joy Capdos Tinacba, Michiro Isobe, Satoshi Hamaguchi · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2021 · 35 citations

Engineering, Atomic Layer Etching, Silicon On Insulator +18

Molecular dynamics simulation of Si and SiO2 reactive ion etching by fluorine-rich ion species

Erin Joy Capdos Tinacba, Michiro Isobe, Kazuhiro Karahashi et al. · Surface and Coatings Technology · 2019 · 27 citations

Ion Implantation, Engineering, Physics +15

Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation

Kohei Mizotani, Michiro Isobe, Masanaga Fukasawa et al. · Journal of Physics D Applied Physics · 2015 · 21 citations

Engineering, Molecular Dynamics Simulation, Computational Chemistry +24

Si Damage Due to Oblique-Angle Ion Impact Relevant for Vertical Gate Etching Processes

Tomoko Ito, Kazuhiro Karahashi, Kohei Mizotani et al. · Japanese Journal of Applied Physics · 2012 · 18 citations

Materials Engineering, Electrical Engineering, Ion Implantation +14

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