Toshiharu Matsuzawa

Azide-phenolic resin photoresists for deep UV lithography

Takao Iwayanagi, T. Kohashi, Saburo Nonogaki et al. · IEEE Transactions on Electron Devices · 1981 · 55 citations

Materials Science, Uv Radiation, Engineering +13

Mechanism of esterification of alcohols with surface silanols and hydrolysis of surface esters on silica gels

Hiroshi UTSUGI, Hideo Horikoshi, Toshiharu Matsuzawa · Journal of Colloid and Interface Science · 1975 · 46 citations

Chemical Engineering, Engineering, Polymer Science +6

Decomposition of benzene in a corona discharge at atmospheric pressure

Kohki Satoh, Toshiharu Matsuzawa, Hidenori Itoh · Thin Solid Films · 2007 · 28 citations

Chemical Engineering, Engineering, Glow Discharge +5

A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment

Akemi Moniwa, Toshiharu Matsuzawa, T. Ito et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 1987 · 23 citations

Optical Design, Engineering, Microscopy +25

Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate

Toshiharu Matsuzawa, Akemi Moniwa, Norio Hasegawa et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 1987 · 22 citations

Electrical Engineering, Photoresist Behavior, Engineering +15