Masahiro Hayama

Characteristics of Hydrogenated Amorphous Silicon Films Prepared by Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition Method and Their Application to Photodiodes

Kazuhiro Kobayashi, Masahiro Hayama, S. Kawamoto et al. · Japanese Journal of Applied Physics · 1987 · 43 citations

Optical Materials, Engineering, Semiconductor Materials +18

Coverage properties of silicon nitride film prepared by the Cat-CVD method

S. Osono, Y. Uchiyama, Makiko Kitazoe et al. · Thin Solid Films · 2003 · 24 citations

Materials Engineering, Materials Science, Engineering +8

Large Scale and Large Area Amorphous Silicon Thin Film Transistor Arrays for Active Matrix Liquid Crystal Displays

H. Miki, S. Kawamoto, Tsuyoshi Horikawa et al. · MRS Proceedings · 1987 · 18 citations

Electrical Engineering, Engineering, Display Technology +8

Characteristics of p-i junction amorphous silicon stripe-type photodiode array and its application to contact image sensor

Masahiro Hayama · IEEE Transactions on Electron Devices · 1990 · 17 citations

Optical Materials, Engineering, Semiconductor Materials +18

Ion bombardment effects on undoped hydrogenated amorphous silicon films deposited by the electron cyclotron resonance plasma chemical vapor deposition method

Masahiro Hayama, H. Murai, Kazuhiro Kobayashi · Journal of Applied Physics · 1990 · 10 citations

Materials Science, Electrical Engineering, Ion Implantation +15