Coverage properties of silicon nitride film prepared by the Cat-CVD method

Deposition of device quality, low <i>H</i> content amorphous silicon

A. H. Mahan, J. J. Carapella, B. P. Nelson et al. · Journal of Applied Physics · 1991 · 481 citations

Natural Sciences, Materials Science, Physics +17

Production of high-quality amorphous silicon films by evaporative silane surface decomposition

James R. Doyle, Robert M. Robertson, G.H. Lin et al. · Journal of Applied Physics · 1988 · 199 citations

Engineering, Materials Engineering, Materials Science +17

Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2

Hideki Matsumura, Hiroyuki Tachibana · Applied Physics Letters · 1985 · 134 citations

Natural Sciences, Materials Engineering, Materials Science +17

Summary of research in NEDO Cat-CVD project in Japan

Hideki Matsumura · Thin Solid Films · 2001 · 93 citations

Natural Sciences, Animal Sciences, Production Medicine +1

Silicon nitride produced by catalytic chemical vapor deposition method

Hideki Matsumura · Journal of Applied Physics · 1989 · 84 citations

Engineering, Materials Engineering, Materials Science +17