Concepedia

C. Rosenblad

CR

Statistics

Publications

13

Citations

558

H-Index

12

Active since

1996

Affiliations

ETH Zurich(Current)

Daimler (Germany)

Paul Scherrer Institute

Aarhus University

Interstate University of Applied Sciences of Technology Buchs

C. Rosenblad is an author at ETH Zurich specializing in materials science, semiconductor devices, and chemical vapor deposition.

Publications per year

1996–2003

13

Publications

13

Silicon epitaxy by low-energy plasma enhanced chemical vapor deposition

C. Rosenblad, H. R. Deller, Alex Dommann et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 148 citations

Natural Sciences, Materials Engineering, Materials Science +17

A plasma process for ultrafast deposition of SiGe graded buffer layers

C. Rosenblad, H. von Känel, Martin Kummer et al. · Applied Physics Letters · 2000 · 79 citations

Engineering, Materials Science, Physics +17

High hole mobility in Si0.17Ge0.83 channel metal–oxide–semiconductor field-effect transistors grown by plasma-enhanced chemical vapor deposition

G. Höck, E. Kohn, C. Rosenblad et al. · Applied Physics Letters · 2000 · 76 citations

Engineering, Electrical Engineering, Materials Science +17

Low energy plasma enhanced chemical vapor deposition

Martin Kummer, C. Rosenblad, Alex Dommann et al. · Materials Science and Engineering B · 2002 · 58 citations

Natural Sciences, Materials Science, Physics +13

Structural characterization of thick, high-quality epitaxial Ge on Si substrates grown by low-energy plasma-enhanced chemical vapor deposition

Shawn Thomas, Sushil Bharatan, Robert E. Jones et al. · Journal of Electronic Materials · 2003 · 41 citations

Engineering, Materials Engineering, Materials Science +17

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