Statistics
Publications
10
Citations
643
H-Index
10
Active since
1993
Affiliations
B. Roberds is an author at Intel (United States) specializing in applied physics, engineering, and microelectronics.
Publications per year
1993–2002
10
10
30 nm physical gate length CMOS transistors with 1.0 ps n-MOS and 1.7 ps p-MOS gate delays
R. Chau, J. Kavalieros, B. Roberds et al. · 2002 · 110 citations
A 50 nm depleted-substrate CMOS transistor (DST)
R. Chau, J. Kavalieros, Barry M. Doyle et al. · 2002 · 101 citations
High permittivity thin film nanolaminates
H. Zhang, Raj Solanki, B. Roberds et al. · Journal of Applied Physics · 2000 · 97 citations · Full text
Materials Science, Zro2–hfo2 Nanolaminates, Electrical Engineering +10
Low temperature Si3N4 direct bonding
R.W. Bower, M.S. Ismail, B. Roberds · Applied Physics Letters · 1993 · 80 citations
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