K. Schruefer

The effects of fluorine on parametrics and reliability in a 0.18-μm 3.5/6.8 nm dual gate oxide CMOS technology

Terence B. Hook, E.L. Adler, F Guarin et al. · IEEE Transactions on Electron Devices · 2001 · 79 citations

Engineering, Electrical Engineering, Materials Science +17

Low-temperature electron mobility in Trigate SOI MOSFETs

J.-P. Colinge, Aidan J. Quinn, Liam Floyd et al. · IEEE Electron Device Letters · 2006 · 76 citations

Engineering, Electrical Engineering, Physics +15

Impact of strained-silicon-on-insulator (sSOI) substrate on FinFET mobility

Wenjing Xiong, C. Rinn Cleavelin, Puneet Kohli et al. · IEEE Electron Device Letters · 2006 · 69 citations

Engineering, Electrical Engineering, Materials Science +16

Temperature effects on trigate SOI MOSFETs

J.-P. Colinge, L. Flo, Aidan J. Quinn et al. · IEEE Electron Device Letters · 2006 · 54 citations

Engineering, Electrical Engineering, Materials Science +17

A 0.13 μm CMOS platform with Cu/low-k interconnects for system on chip applications

T. Schiml, S. Biesemans, G. Brase et al. · 2002 · 53 citations

Engineering, Computer Engineering, Electrical Engineering +17