I. Toqué‐Tresonne

Doping of semiconductor devices by Laser Thermal Annealing

Karim Huet, Fulvio Mazzamuto, Toshiyuki Tabata et al. · Materials Science in Semiconductor Processing · 2016 · 64 citations

Engineering, Materials Engineering, Materials Science +14

New insights on bottom layer thermal stability and laser annealing promises for high performance 3D VLSI

C. Fenouillet-Béranger, B. Mathieu, B. Prévitali et al. · 2014 · 56 citations

Engineering, Electrical Engineering, Materials Science +17

Optimized Laser Thermal Annealing on Germanium for High Dopant Activation and Low Leakage Current

Maryam Shayesteh, Dan Connell, Farzan Gity et al. · IEEE Transactions on Electron Devices · 2014 · 45 citations

Engineering, Electrical Engineering, Materials Science +17

Atomically Flat Low-Resistive Germanide Contacts Formed by Laser Thermal Anneal

Maryam Shayesteh, Karim Huet, I. Toqué‐Tresonne et al. · IEEE Transactions on Electron Devices · 2013 · 30 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Analysis of performance/variability trade-off in Macaroni-type 3-D NAND memory

G. Congedo, A. Arreghini, Li Liu et al. · 2014 · 27 citations

Engineering, Electrical Engineering, Materials Engineering +16