Alek C. Chen

Development of layout split algorithms and printability evaluation for double patterning technology

Tsann-Bim Chiou, Robert Socha, Hong Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 38 citations

Pattern Split, Engineering, Electron-beam Lithography +19

Full-chip pitch/pattern splitting for lithography and spacer double patterning technologies

Tsann-Bim Chiou, Robert Socha, Hoyoung Kang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 13 citations

Optimization of alignment/overlay sampling and marker layout to improve overlay performance for double patterning technology

Chuei-Fu Chue, Tsann-Bim Chiou, Chun-Yen Huang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 13 citations

Engineering, Electronic Design Automation, Computer Architecture +16

The lithography technology for the 32 nm HP and beyond

Mircea Dusa, Jo Finders, H. Meiling et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 11 citations · Full text

Engineering, Water-based Immersion Lithography, Electron-beam Lithography +17