Concepedia

Junichi Tonotani

JT

6

Publications

226

Citations

6

H-Index

2002

Active since

Affiliations

Toshiba (Japan)(Current)

Tokyo Institute of Technology

Junichi Tonotani is an author at Toshiba (Japan) specializing in engineering, applied physics, and electrical engineering.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMicroelectronicsElectrical EngineeringCorrosionThin FilmsSurface ScienceChemical EngineeringMaterials Engineering

Publications per year

2002–2011

6

Publications

6

Advanced gate dielectric materials for sub-100 nm CMOS

Hiroshi Iwai, Shun-ichiro Ohmi, S. Akama et al. · 2003 · 95 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Dry etching characteristics of TiN film using Ar/CHF3, Ar/Cl2, and Ar/BCl3 gas chemistries in an inductively coupled plasma

Junichi Tonotani, Takuya Iwamoto, Fumihiko Satô et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 74 citations

Materials Science, Materials Engineering, Chemical Engineering +13

4.1: Low‐Temperature‐Processed IGZO TFTs for Flexible AMOLED with Integrated Gate Driver Circuits

Kentaro Miura, Tomomasa Ueda, Shintaro Nakano et al. · SID Symposium Digest of Technical Papers · 2011 · 22 citations

Electrical Engineering, Engineering, Flexible Amoled +6

Measurement of Electron Density of Reactive Plasma Using a Plasma Oscillation Method

Masaaki Kanoh, Junichi Tonotani, Katsuaki Aoki et al. · Japanese Journal of Applied Physics · 2002 · 14 citations

Electron Density, Electrical Engineering, Engineering +11

Effect of CHF<sub>3</sub> Addition on Reactive Ion Etching of Aluminum Using Inductively Coupled Plasma

Shuichi Saito, Kazuyuki Sugita, Junichi Tonotani · Japanese Journal of Applied Physics · 2005 · 11 citations

Materials Science, Materials Engineering, Chemical Engineering +14

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