D. Machajdı́k

Ru and RuO2 gate electrodes for advanced CMOS technology

K. Fröhlich, K. Hušeková, D. Machajdı́k et al. · Materials Science and Engineering B · 2004 · 61 citations

Electrical Engineering, Engineering, Advanced Cmos Technology +5

Growth and recrystallization of CeO2 thin films deposited on R-plane sapphire by off-axis RF sputtering

M. Španková, I. Vávra, Š. Gaži et al. · Journal of Crystal Growth · 2000 · 40 citations

Materials Engineering, Materials Science, Engineering +10

Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology

P. Písečný, K. Hušeková, K. Fröhlich et al. · Materials Science in Semiconductor Processing · 2004 · 37 citations

Materials Science, Electrical Engineering, Epitaxial Growth +12

Structure, grain connectivity and pinning of as-deformed commercial MgB2 powder in Cu and Fe/Cu sheaths

P Kov aacute c, I Hušek, W. Pachla et al. · Superconductor Science and Technology · 2002 · 37 citations

Magnetic Properties, Engineering, Severe Plastic Deformation +18

Growth of gadolinium oxide films for advanced MOS structure

R. Lupták, K. Fröhlich, A. Rosová et al. · Microelectronic Engineering · 2005 · 27 citations

Materials Engineering, Materials Science, Engineering +5