P. Písečný

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Active since

2004

Affiliations

Instituto de Ciencia de Materiales de Sevilla(Current)

P. Písečný is an author at Instituto de Ciencia de Materiales de Sevilla specializing in oxide semiconductors, microelectronics, and materials science.

Publications per year

2004–2006

Publications

Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology

P. Písečný, K. Hušeková, K. Fröhlich et al. · Materials Science in Semiconductor Processing · 2004 · 37 citations

Engineering, Electrical Engineering, Materials Science +16

Characterization of rare earth oxides based MOSFET gate stacks prepared by metal-organic chemical vapour deposition

K. Fröhlich, R. Lupták, Edmund Dobročka et al. · Materials Science in Semiconductor Processing · 2006 · 24 citations

Engineering, Materials Engineering, Materials Science +16

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