Vincent Truffert

High-resolution EUV imaging tools for resist exposure and aerial image monitoring

Martin J. Booth, O. Brisco, Adam N. Brunton et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 37 citations

Engineering, Mechanical Engineering, Digital Imaging +9

Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process

Lieve Van Look, Joost Bekaert, Vincent Truffert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 28 citations

Engineering, Electrical Engineering, Materials Science +7

Metrology of thin resist for high NA EUVL

Gian F. Lorusso, Christophe Béral, Janusz Bogdanowicz et al. · Metrology, Inspection, and Process Control XXXVI · 2022 · 18 citations

Engineering, Electrical Engineering, Materials Science +13

A new paradigm for in-line detection and control of patterning defects

S. Hunsche, M. Jochemsen, Vivek Jain et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 15 citations

Engineering, Electrical Engineering, Manufacturing Engineering +17

Ultimate contact hole resolution using immersion lithography with line/space imaging

Vincent Truffert, Joost Bekaert, Frédéric Lazzarino et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 13 citations

Natural Sciences, Materials Engineering, Biomedical Imaging +11