Vincent Truffert

High-resolution EUV imaging tools for resist exposure and aerial image monitoring

Martin J. Booth, O. Brisco, Adam N. Brunton et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 37 citations

High Resolution, Engineering, Microscopy +21

Printing the metal and contact layers for the 32- and 22-nm node: comparing positive and negative tone development process

Lieve Van Look, Joost Bekaert, Vincent Truffert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 28 citations

Contact Patterning, Engineering, Electron-beam Lithography +21

A new paradigm for in-line detection and control of patterning defects

S. Hunsche, M. Jochemsen, Vivek Jain et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 15 citations

Engineering, Detection Technique, Defect Tolerance +22

Metrology of thin resist for high NA EUVL

Gian F. Lorusso, Christophe Béral, Janusz Bogdanowicz et al. · Metrology, Inspection, and Process Control XXXVI · 2022 · 14 citations

Ultimate contact hole resolution using immersion lithography with line/space imaging

Vincent Truffert, Joost Bekaert, Frédéric Lazzarino et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 13 citations