H.D. Goldbach

Growth of NiO and MgO Films on Ag(100)

J. Wollschläger, D. Erdös, H.D. Goldbach et al. · Thin Solid Films · 2001 · 114 citations

Materials Science, Materials Engineering, Engineering +5

Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

V. Verlaan, C.H.M. van der Werf, W.M. Arnoldbik et al. · Physical Review B · 2006 · 50 citations

Restructuring process of the Si(111) surface upon Ca deposition

V.G. Lifshits, K.V. Ignatovich, H. Bethge et al. · Surface Science · 2000 · 46 citations

Materials Science, Surface Characterization, Engineering +5

Multi‐crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot‐wire CVD silicon nitride as antireflection coating

V. Verlaan, C.H.M. van der Werf, Z.S. Houweling et al. · Progress in Photovoltaics Research and Applications · 2007 · 30 citations

Engineering, Antireflection Coating, Semiconductor Materials +21

Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

C.H.M. van der Werf, H.D. Goldbach, J. Löffler et al. · Thin Solid Films · 2005 · 27 citations

Materials Science, Antireflection Layer, Electrical Engineering +9