V. Verlaan

Composition and bonding structure of plasma‐assisted ALD Al₂O₃ films

V. Verlaan, L. R. J. G. van den Elzen, G. Dingemans et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2010 · 70 citations

Natural Sciences, Materials Engineering, Materials Science +17

Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

V. Verlaan, C.H.M. van der Werf, W.M. Arnoldbik et al. · Physical Review B · 2006 · 50 citations

Natural Sciences, Materials Science, Physics +15

The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

V. Verlaan, A.D. Verkerk, W.M. Arnoldbik et al. · Thin Solid Films · 2009 · 42 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +14

Initiated chemical vapour deposition (iCVD) of thermally stable poly-glycidyl methacrylate

Reuben M. Bakker, V. Verlaan, C.H.M. van der Werf et al. · Surface and Coatings Technology · 2007 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +11

Multi‐crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot‐wire CVD silicon nitride as antireflection coating

V. Verlaan, C.H.M. van der Werf, Z.S. Houweling et al. · Progress in Photovoltaics Research and Applications · 2007 · 30 citations

Engineering, Materials Engineering, Materials Science +17