W.M. Arnoldbik

Atomic Layer Deposition of LiCoO₂Thin-Film Electrodes for All-Solid-State Li-Ion Micro-Batteries

Merijn E. Donders, W.M. Arnoldbik, Harm C. M. Knoops et al. · Journal of The Electrochemical Society · 2013 · 111 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

Joonhwa Hong, W. M. M. Kessels, W.J. Soppe et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 104 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Dynamic behavior of hydrogen in silicon nitride and oxynitride films made by low-pressure chemical vapor deposition

W.M. Arnoldbik, C. H. M. Marée, A. J. H. Maas et al. · Physical review. B, Condensed matter · 1993 · 58 citations

Natural Sciences, Chemistry, Materials Science +17

Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

V. Verlaan, C.H.M. van der Werf, W.M. Arnoldbik et al. · Physical Review B · 2006 · 50 citations

Natural Sciences, Materials Science, Physics +15

Electronic sputtering of thin SiO2 films by MeV heavy ions

W.M. Arnoldbik, N. Tomozeiu, F.H.P.M. Habraken · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2003 · 48 citations

Natural Sciences, Materials Engineering, Materials Science +13