Z.S. Houweling - Concepedia

Author

Z.S. Houweling

Utrecht University ORCID

Also Known As

Houweling, Z.S., Silvester Houweling, Z Silvester Houweling, Z. S. Houweling, Z. Silvester Houweling, Z.S. Houweling

Publications

465

Citations

H-Index

Concepts

All Affiliations

Utrecht University Energy Research Centre of the Netherlands IMEC

About

Z.S. Houweling is an author at Utrecht University specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	13	326
2	Applied Physics	10	12	314
3	Materials Science	10	12	310
4	Electrical Engineering	3	3	63
5	Chemical Engineering	1	1	12

Z.S. Houweling

Publications

342

Citations

H-Index

Page 1

	Year	Citations
Nanorod solar cell with an ultrathin a-Si:H absorber layer Yinghuan Kuang, Karine H. M. van der Werf, Z.S. Houweling, Applied Physics Letters EngineeringZinc OxidePlasmon-enhanced PhotovoltaicsSilicon On InsulatorPhotovoltaics	2011	82
The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD V. Verlaan, A.D. Verkerk, W.M. Arnoldbik, Thin Solid Films Materials ScienceEngineeringOptical PropertiesSilicon On InsulatorApplied Physics	2009	42
Multi‐crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot‐wire CVD silicon nitride as antireflection coating V. Verlaan, C.H.M. van der Werf, Z.S. Houweling, Progress in Photovoltaics Research and Applications EngineeringAntireflection CoatingSemiconductor MaterialsPhotovoltaic DevicesIntegrated Circuits	2007	30
Growth process conditions of tungsten oxide thin films using hot-wire chemical vapor deposition Z.S. Houweling, J.W. Geus, Marion de Jong, Materials Chemistry and Physics Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	2011	24
High-density silicon nitride deposited at low substrate temperature with high deposition rate using hot wire chemical vapour deposition V. Verlaan, Reuben M. Bakker, C.H.M. van der Werf, Surface and Coatings Technology Materials ScienceLow Substrate TemperatureEngineeringApplied PhysicsSemiconductor Device Fabrication	2007	23
Hot-wire chemical vapor deposition of WO3−x thin films of various oxygen contents Z.S. Houweling, J.W. Geus, R.E.I. Schropp Materials Chemistry and Physics Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	2013	23
Synthesis of WO<sub>3</sub> Nanogranular Thin Films by Hot‐Wire CVD Z.S. Houweling, J.W. Geus, R.E.I. Schropp Chemical Vapor Deposition Materials ScienceHigh Temperature MaterialsEngineeringNanomaterialsNanotechnology	2010	22
Deposition of device quality silicon nitride with ultra high deposition rate (>7 nm/s) using hot-wire CVD V. Verlaan, Z.S. Houweling, C.H.M. van der Werf, Thin Solid Films Materials ScienceElectrical EngineeringWafer Scale ProcessingEngineeringApplied Physics	2007	17
All hot wire CVD TFTs with high deposition rate silicon nitride (3nm/s) R.E.I. Schropp, Shogo Nishizaki, Z.S. Houweling, Solid-State Electronics Electrical EngineeringEngineeringPhysicsNanoelectronicsApplied Physics	2008	16
Strengthening ultrathin Si3N4 membranes by compressive surface stress A G Shafikov, Bart Schurink, Robbert Wilhelmus Elisabeth van de Kruijs, Sensors and Actuators A Physical	2020	16

Page 1