C. W. Gwyn - Concepedia

Author

C. W. Gwyn

Sandia National Laboratories California

Also Known As

C. Gwyn, C. W. Gwyn, C.W. Gwyn, Charles Gwyn, Charles W. Gwyn, Gwyn, Charles W.

Publications

1.1K

Citations

H-Index

Concepts

All Affiliations

Sandia National Laboratories California Intel (United States)Lawrence Berkeley National Laboratory Sandia National Laboratories Lawrence Livermore National Laboratory

About

C. W. Gwyn is an author at Sandia National Laboratories California specializing in engineering, microelectronics, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	15	21	1K
2	Natural Sciences	4	4	125
3	Health Sciences	3	3	327
4	Education	2	2	58
5	Business	1	1	10

C. W. Gwyn

Publications

Citations

H-Index

Page 1

	Year	Citations
Extreme ultraviolet lithography C. W. Gwyn, R. H. Stulen, Donald W. Sweeney, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Ultraviolet LightLithography ToolShort Wavelength OpticEngineeringElectron-beam Lithography	1998	249
Model for Radiation-Induced Charge Trapping and Annealing in the Oxide Layer of MOS Devices C. W. Gwyn Journal of Applied Physics EngineeringFused SilicaSilicon On InsulatorSemiconductor DeviceMos Devices	1969	139
Radiation effects on semiconductor devices B. L. Gregory, C. W. Gwyn Proceedings of the IEEE Semiconductor TechnologyElectrical EngineeringEngineeringNanoelectronicsBias Temperature Instability	1974	111
The Analysis of Radiation Effects in Semiconductor Junction Devices C. W. Gwyn, D.L. Scharfetter, Jochen Wirth IEEE Transactions on Nuclear Science Device ModelingElectrical EngineeringSemiconductor DeviceEngineeringBipolar Transistor	1967	100
Methods for Hierarchical Automatic Layout of Custom LSI Circuit Masks Bryan Preas, C. W. Gwyn Design Automation Conference EngineeringElectronic Design AutomationElectronic DesignComputer ArchitectureComputer-aided Design	1978	50
Methods for Hierarchical Automatic Layout of Custom LSI Circuit Masks Bryan Preas, C. W. Gwyn EngineeringElectronic Design AutomationElectronic DesignComputer ArchitectureComputer-aided Design	1978	48
<title>System integration and performance of the EUV engineering test stand</title> Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, William C. Replogle, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Engineering Test StandEngineeringElectron-beam LithographyMicroscopyOptic Design	2001	40
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyMicroscopy	2002	38
First lithographic results from the extreme ultraviolet Engineering Test Stand Henry N. Chapman, Avijit K. Ray-Chaudhuri, Daniel A. Tichenor, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceUltraviolet LightEngineering Test StandEngineeringElectron-beam Lithography	2001	37
Automatic circuit analysis based on mask information Bryan Preas, B. W. Lindsay, C. W. Gwyn EngineeringMask InformationInformation ForensicsCircuit Mask TranslatorCircuit Mask Information	1976	36

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