Concepedia

Haruko Akutsu

HA

Statistics

Publications

8

Citations

176

H-Index

8

Active since

2001

Affiliations

Toshiba (Japan)(Current)

Toshiba Nanoanalysis Corporation

Haruko Akutsu is an author at Toshiba (Japan) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsMicroelectronicsElectrical EngineeringPhysicsChemistryNanotechnologySurface Science

Publications per year

2001–2012

8

Publications

8

10–15 nm Ultrashallow Junction Formation by Flash-Lamp Annealing

Takayuki Ito, Toshihiko Iinuma, Atsushi Murakoshi et al. · Japanese Journal of Applied Physics · 2002 · 82 citations

Materials Science, Semiconductor Technology, Electrical Engineering +11

Influence of multi-hit capability on quantitative measurement of NiPtSi thin film with laser-assisted atom probe tomography

T. Kinno, Haruko Akutsu, M. Tomita et al. · Applied Surface Science · 2012 · 16 citations

Materials Science, Engineering, Physics +12

Advanced Ion Implantation Technology for High Performance Transistors

K. Suguro, Atsushi Murakoshi, Toshihiko Iinuma et al. · MRS Proceedings · 2001 · 16 citations

Ion Implantation, Electrical Engineering, Engineering +4

Mechanism of Contact Resistance Reduction in Nickel Silicide Films by Pt Incorporation

Takeshi Sonehara, A. Hokazono, Haruko Akutsu et al. · IEEE Transactions on Electron Devices · 2011 · 15 citations

Contact Resistance Reduction, Engineering, Nickel Silicide Films +16

Contact resistance reduction of Pt-incorporated NiSi for continuous CMOS scaling &#x223C; Atomic level analysis of Pt/B/As distribution within silicide films &#x223C;

Takeshi Sonehara, A. Hokazono, Haruko Akutsu et al. · 2008 · 14 citations

Contact Resistance Reduction, Silicide Grain Boundary, Engineering +20

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