W. Krull - Concepedia

Author

W. Krull

University of Florida

Also Known As

W. A. Krull, W. Krull, W.A. Krull, Wade A Krull, Wade A. Krull, Wade Krull

Publications

484

Citations

H-Index

Concepts

All Affiliations

University of Florida Ibis Reproductive Health United States Naval Research Laboratory

About

W. Krull is an author at University of Florida specializing in applied physics, engineering, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Applied Physics	12	14	292
2	Engineering	11	13	251
3	Chemical Engineering	2	2	36
4	Medicine	1	1	12
5	Natural Sciences	1	1	18

W. Krull

Publications

310

Citations

H-Index

Page 1

	Year	Citations
Ultra-shallow junction formation by B18H22 ion implantation Yoji Kawasaki, T. Kuroi, Takashi Yamashita, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Ion ImplantationUltra-shallow Junction FormationApplied PhysicsPhysics	2005	41
Reduction of charge trappings and electron tunneling in SIMOX by supplemental implantation of oxygen Robert E. Stahlbush, H.L. Hughes, W. Krull IEEE Transactions on Nuclear Science SemiconductorsSupplemental ImplantationElectrical EngineeringEngineeringPhysics	1993	40
Demonstration of the benefits of SOI for high temperature operation W. Krull, J.C. Lee Electrical EngineeringEngineeringVlsi DesignAdvanced Packaging (Semiconductors)High Temperature Operation	2003	32
Determination of the fixed oxide charge and interface trap densities for buried oxide layers formed by oxygen implantation F.T. Brady, S. S. Li, D.E. Burk, Applied Physics Letters Materials ScienceElectrical EngineeringEngineeringOxygen ImplantationOxidation Resistance	1988	29
Neutron irradiation effects on AlGaAs/GaAs heterojunction bipolar transistors G.A. Schrantz, N. W. van Vonno, W. Krull, IEEE Transactions on Nuclear Science SemiconductorsSemiconductor TechnologyElectrical EngineeringEngineeringTunneling-assisted Trapping	1988	26
Charge trapping and transport properties of SIMOX buried oxides with a supplemental oxygen implant H. E. Boesch, Thomas L. Taylor, W. Krull IEEE Transactions on Nuclear Science Materials ScienceOxygen Reduction ReactionElectrical EngineeringChemical EngineeringCharge Trapping	1993	24
Ultra-high resolution mass spectroscopy of boron cluster ions D. C. Jacobson, T. N. Horsky, W. Krull, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Boron NitridePhysicsBoron Cluster IonsSpectroscopyNatural Sciences	2005	18
Electrical and radiation characterization of three SOI material technologies W. Krull, J.F. Buller, G.V. Rouse, IEEE Circuits and Devices Magazine EngineeringDevice IntegrationSilicon On InsulatorInterconnect (Integrated Circuits)Advanced Packaging (Semiconductors)	1987	15
Decaborane ion implantation A. S. Perel, W. Krull, David E. Hoglund, 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) Materials ScienceMaterials EngineeringElectrical EngineeringIon ImplantationEngineering	2003	14
Radiation-induced charge trapping in implanted buried oxides F.T. Brady, Sheng S. Li, W. Krull Journal of Applied Physics Materials ScienceIon ImplantationEngineeringOxygen ImplantationOxide Electronics	1990	13

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