C. J. Peters

Material aspects of nickel silicide for ULSI applications

Dan‐Xia Xu, S. R. Das, C. J. Peters et al. · Thin Solid Films · 1998 · 73 citations

Materials Engineering, Materials Science, Engineering +4

Process Windows of Nickel and Platinum Silicides in Deep Sub-Micron Regime

Dan‐Xia Xu, S. R. Das, J. P. McCaffrey et al. · MRS Proceedings · 1995 · 28 citations

Materials Science, Nanoscale Science, Process Windows +11

Defect reduction in GaN epilayers and HFET structures grown on (0001)sapphire by ammonia MBE

James B. Webb, H. Tang, J. A. Bardwell et al. · Journal of Crystal Growth · 2001 · 27 citations

Materials Science, Materials Engineering, Wide-bandgap Semiconductor +6

A floating-gate MOSFET gamma dosimeter

C. J. Peters, N. G. Tarr, K R Shortt et al. · Canadian Journal of Physics · 1996 · 17 citations

Electrical Engineering, Radiation Testing, Engineering +15

Distribution of base dopant for transit time minimization in a bipolar transistor

S.S. Winterton, S. Searles, C. J. Peters et al. · IEEE Transactions on Electron Devices · 1996 · 16 citations

Device Modeling, Electrical Engineering, Neutral Base +11