J. Sporre

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 139 citations

Engineering, Electron-beam Lithography, Finfet Technology +18

FINFET technology featuring high mobility SiGe channel for 10nm and beyond

Dechao Guo, G. Karve, Gen Tsutsui et al. · 2016 · 64 citations

Engineering, Vlsi Design, Device Integration +16

A 7nm CMOS technology platform for mobile and high performance compute application

B. Jagannathan, Akihisa Ogino, D. Jaeger et al. · 2017 · 58 citations

Engineering, Vlsi Design, Computer Architecture +17

<i>In situ</i> collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources

Daniel T. Elg, J. Sporre, Gianluca Panici et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 37 citations

Ultraviolet Light, Engineering, Plasma Physics +20

Magnetic debris mitigation system for extreme ultraviolet sources

Daniel T. Elg, J. Sporre, Davide Curreli et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2015 · 20 citations

Materials Science, Ultraviolet Light, Magnetism +15