J. Sporre

A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels

Ruijie Xie, P. Montanini, Kerem Akarvardar et al. · 2016 · 144 citations

Engineering, Electrical Engineering, Materials Science +15

FINFET technology featuring high mobility SiGe channel for 10nm and beyond

Dechao Guo, G. Karve, Gen Tsutsui et al. · 2016 · 65 citations

Engineering, Computer Engineering, Electrical Engineering +14

A 7nm CMOS technology platform for mobile and high performance compute application

B. Jagannathan, Akihisa Ogino, D. Jaeger et al. · 2017 · 60 citations

Engineering, Computer Engineering, Electrical Engineering +14

<i>In situ</i> collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources

Daniel T. Elg, J. Sporre, Gianluca Panici et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 38 citations

Natural Sciences, Materials Science, Physics +15

Magnetic debris mitigation system for extreme ultraviolet sources

Daniel T. Elg, J. Sporre, Davide Curreli et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2015 · 21 citations

Natural Sciences, Materials Science, Physics +9