Concepedia
Statistics
Publications
6
Citations
116
H-Index
Active since
1977
Affiliations
Siemens (Germany)(Current)
Infineon Technologies (Germany)
B. Hasler is an author at Siemens (Germany) specializing in materials science, engineering, and electronic materials.
Publications per year
1977–2002
Investigations on the damage caused by ion etching of SiO2 layers at low energy and high dose
H.R. Deppe, B. Hasler, Joachim Höpfner · Solid-State Electronics · 1977 · 43 citations
Engineering, Materials Engineering, Materials Science +17
Reactive ion etching of Ta–silicide/polysilicon double layers for the fabrication of integrated circuits
H. J. Mattausch, B. Hasler, W. Beinvogl · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1983 · 19 citations
Engineering, Electrical Engineering, Materials Science +17
Review of SrBi<sub>2</sub>Ta<sub>2</sub>O<sub>9</sub> thin films capacitor processing
C. Dehm, Walter Hartner, G. Schindler et al. · Integrated ferroelectrics · 1999 · 15 citations
Natural Sciences, Materials Engineering, Materials Science +17
Plasma etching of polysilicon and Si<sub>3</sub>N<sub>4</sub>in SF<sub>6</sub>with some impact on MOS device characteristics
W. Beinvogl, H.R. Deppe, R. Stokan et al. · IEEE Transactions on Electron Devices · 1981 · 15 citations
Engineering, Electrical Engineering, Materials Science +16
ROS: an extremely high density mask ROM technology based on vertical transistor cells
E. Bertagnolli, F. Hofmann, J. Willer et al. · 2002 · 14 citations
Engineering, Computer Engineering, Electrical Engineering +16
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