T. Kauerauf

Characterization of the V/sub T/-instability in SiO/sub 2//HfO/sub 2/ gate dielectrics

A. Kerber, E. Cartier, L. Pantisano et al. · 2003 · 92 citations

Engineering, Electrical Engineering, Microelectronics +16

Charge trapping and dielectric reliability of SiO/sub 2/-Al/sub 2/O/sub 3/ gate stacks with TiN electrodes

A. Kerber, E. Cartier, R. Degraeve et al. · IEEE Transactions on Electron Devices · 2003 · 67 citations

Engineering, Materials Engineering, Materials Science +17

Effect of bulk trap density on HfO/sub 2/ reliability and yield

R. Degraeve, A. Kerber, P. Roussell et al. · 2004 · 42 citations

Engineering, Materials Engineering, Materials Science +14

Gate-last vs. gate-first technology for aggressively scaled EOT logic/RF CMOS

A. Veloso, L.-Å. Ragnarsson, M. J. Cho et al. · Symposium on VLSI Technology · 2011 · 31 citations

Engineering, Electrical Engineering, Materials Science +17

Off-state TDDB in FinFET Technology and its Implication for Safe Operating Area

M. Toledano-Luque, P. Paliwoda, M. Nour et al. · 2021 · 15 citations

Engineering, Electrical Engineering, Circuit Theory +13