R.M. Sicina

Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO₂ gate dielectrics

Min Yang, E. P. Gusev, M. Ieong et al. · IEEE Electron Device Letters · 2003 · 166 citations

Engineering, Electrical Engineering, Materials Science +17

Two gates are better than one [double-gate MOSFET process]

P. M. Solomon, K.W. Guarini, Yifan Zhang et al. · IEEE Circuits and Devices Magazine · 2003 · 81 citations

Engineering, Computer Engineering, Electrical Engineering +16

Triple-self-aligned, planar double-gate MOSFETs: devices and circuits

K.W. Guarini, P. M. Solomon, Y. Zhang et al. · 2002 · 68 citations

Engineering, Electrical Engineering, Materials Science +17

Lithography and fabrication processes for sub-100 nm scale complementary metal–oxide semiconductor

Shalom J. Wind, Y. Taur, Y. H. Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1995 · 17 citations

Engineering, Electrical Engineering, Materials Science +17