H. Kikuyama

Gas-phase selective etching of native oxide

Nobuhiko Miki, H. Kikuyama, I. Kawanabe et al. · IEEE Transactions on Electron Devices · 1990 · 79 citations

Materials Engineering, Materials Science, Chemical Engineering +15

A Study of the Dissociation State and the SiO2 Etching Reaction for  HF  Solutions of Extremely Low Concentration

H. Kikuyama, Minoru Waki, M. Miyashita et al. · Journal of The Electrochemical Society · 1994 · 46 citations

Engineering, Chemistry, Silicon On Insulator +24

Etching Rate and Mechanism of Doped Oxide in Buffered Hydrogen Fluoride Solution

H. Kikuyama, Minoru Waki, I. Kawanabe et al. · Journal of The Electrochemical Society · 1992 · 44 citations

Materials Engineering, Materials Science, Chemical Engineering +13

Surface active buffered hydrogen fluoride having excellent wettability for ULSI processing

H. Kikuyama, Nobuhiko Miki, K. Saka et al. · IEEE Transactions on Semiconductor Manufacturing · 1990 · 34 citations

Engineering, Surfactants, Chemistry +21

Effects of Iron Fluoride Layer on Durability of Cryogenic High-Speed Ball Bearings for Rocket Turbopumps

Masataka Nosaka, Masataka Kikuchi, Nobuyuki Kawai et al. · Tribology Transactions · 2000 · 19 citations

Materials Science, Tribological Coating, Liquid Nitrogen +13