Concepedia

R. Fiordalice

RF

Statistics

Publications

8

Citations

235

H-Index

8

Active since

1989

Affiliations

Motorola (United States)(Current)

R. Fiordalice is an author at Motorola (United States) specializing in materials science, engineering, and surface science.

Top concepts

EngineeringMaterial ScienceApplied PhysicsSurface ScienceThin FilmsChemistrySurface TechnologyMaterials EngineeringMicroelectronicsCrystalline Defects

Publications per year

1989–2003

8

Publications

8

Thin film properties of low-pressure chemical vapor deposition TiN barrier for ultra-large-scale integration applications

Rama I. Hegde, R. Fiordalice, E. Travis et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1993 · 83 citations

Engineering, Oxidation Resistance, Thin Film Process Technology +20

Raman scattering characterization of titanium silicide formation

R. J. Nemanich, R. Fiordalice, Hyeongtag Jeon · IEEE Journal of Quantum Electronics · 1989 · 45 citations

Engineering, Surface-enhanced Raman Scattering, Thin Film Process Technology +16

Manufacturing aspects of low pressure chemical-vapor-deposited TiN barrier layers

E. Travis, R. Fiordalice · Thin Solid Films · 1993 · 33 citations

Materials Engineering, Materials Science, Engineering +5

TiNCl formation during low-temperature, low-pressure chemical vapor deposition of TiN

Rama I. Hegde, R. Fiordalice, Philip J. Tobin · Applied Physics Letters · 1993 · 26 citations

Materials Engineering, Materials Science, Tin Films +11

Characterization of copper voids in dual damascene processes

R.L. Guldi, J. B. Shaw, J. Ritchison et al. · 2003 · 15 citations

Engineering, Integrated Circuits, Chemical Deposition +16

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