Reactive ion etching of diamond in CF4, O2, O2 and Ar-based mixtures

Chemistry and industry

W. J. U. Woolcock · Journal of the Society of Chemical Industry · 1924 · 885 citations

Etch rates for micromachining processing

K.R. Williams, R.S. Muller · Journal of Microelectromechanical Systems · 1996 · 634 citations

Engineering, Materials Engineering, Materials Science +17

Universal energy dependence of physical and ion-enhanced chemical etch yields at low ion energy

Christoph Steinbrüchel · Applied Physics Letters · 1989 · 287 citations

Natural Sciences, Materials Engineering, Materials Science +14

Reactive ion etching of diamond

Gurtej Sandhu, Whei-Lee Chu · Applied Physics Letters · 1989 · 108 citations

Natural Sciences, Materials Engineering, Materials Science +16

The preparation and characterization of low surface roughness (111) and (100) natural diamonds by hydrogen plasma

Olivier M. Küttel, L. Diederich, E. Schaller et al. · Surface Science · 1995 · 100 citations

Natural Sciences, Materials Engineering, Materials Science +11