A revisit from CVD kinetics to CVD reactor: Investigating uniform growth mechanism of polysilicon in a reduction furnace

A procedure for the estimation of the numerical uncertainty of CFD calculations based on grid refinement studies

Luís Eça, M. Hoekstra · Journal of Computational Physics · 2014 · 520 citations

Computing, Computational Engineering, Mechanical Engineering +16

A Numerical Study of a Bluff-Body Stabilized Diffusion Flame. Part 2. Influence of Combustion Modeling And Finite-Rate Chemistry

Inge R. Gran, Bjørn F. Magnussen · Combustion Science and Technology · 1996 · 387 citations

Engineering, Chemical Engineering, Mechanical Engineering +17

Model on transport phenomena and epitaxial growth of silicon thin film in SiHCl3H2 system under atmospheric pressure

Hitoshi Habuka, Takatoshi Nagoya, Masanori Mayusumi et al. · Journal of Crystal Growth · 1996 · 103 citations

Engineering, Materials Engineering, Materials Science +17

An ab initio MO study of the thermal decomposition of chlorinated monosilanes, SiH4-nCln (n = 0-4)

Ming Der Su, H. Bernard Schlegel · The Journal of Physical Chemistry · 1993 · 85 citations

Natural Sciences, Chemistry, Chemical Kinetics +13

Chemical reaction engineering in the design of CVD reactors

Hiroshi Komiyama, Yukihiro Shimogaki, Yasuyuki Egashira · Chemical Engineering Science · 1999 · 70 citations

Engineering, Chemical Engineering, Chemistry +14