High patterning photosensitivity by a novel fluorinated copolymer formulated resist

Lithography gets extreme

Christian Wagner, Noreen Harned · Nature Photonics · 2009 · 623 citations

Promising Lithography Techniques for Next-Generation Logic Devices

Rashed Md. Murad Hasan, Xichun Luo · Nanomanufacturing and Metrology · 2018 · 150 citations · Full text

Engineering, Manufacturing Engineering, Materials Science +13

Novel Fluorinated Polymers Containing Short Perfluorobutyl Side Chains and Their Super Wetting Performance on Diverse Substrates

Jingxian Jiang, Guangfa Zhang, Qiongyan Wang et al. · ACS Applied Materials & Interfaces · 2016 · 111 citations

Natural Sciences, Chemistry, Materials Science +16

Secondary Electrons in EUV Lithography

Justin Torok, Ryan Del Re, Henry Herbol et al. · Journal of Photopolymer Science and Technology · 2013 · 108 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +9

Recent developments in photoresists for extreme-ultraviolet lithography

Christopher K. Ober, Florian Käfer, Chenyun Yuan · Polymer · 2023 · 96 citations · Full text

Engineering, Materials Engineering, Materials Science +12