Publication | Closed Access
The effect of annealing on photoluminescence from defects in ammonothermal GaN
33
Citations
39
References
2022
Year
Wide-bandgap SemiconductorGallium VacancyOptical MaterialsEngineeringVga-3hi ComplexAmmonothermal GanOptoelectronic DevicesChemistryLuminescence PropertySemiconductorsPhotoluminescencePhysicsOptoelectronic MaterialsAluminum Gallium NitrideGallium OxideCategoryiii-v SemiconductorNatural SciencesApplied PhysicsGan Power DeviceOptoelectronics
Ammonothermal GaN samples with the concentration of free electrons of 1018 and 1019 cm−3 were annealed in a wide range of temperatures (Tann = 300–1400 °C) under atmospheric N2 pressure and under ultra-high N2 pressure conditions to avoid the GaN decomposition. Photoluminescence (PL) studies reveal the YL2 band with a maximum at 2.3 eV before annealing and two new PL bands after annealing at Tann > 600 °C: the OL3 band with a maximum at 2.1 eV and the RL4 band with a maximum at 1.6–1.7 eV. The ammonothermal GaN samples have high concentrations of complexes containing gallium vacancy (VGa), hydrogen, and oxygen. The first-principles calculations suggest that the VGa-3Hi complex is the origin of the YL2 band, while the VGa-3ON complex is responsible for the RL4 band.
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