Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications

X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92

B. L. Henke, Eric M. Gullikson, J.C. Davis · Atomic Data and Nuclear Data Tables · 1993 · 6.1K citations

X-ray Spectroscopy, Engineering, Physics +7

IMD—Software for modeling the optical properties of multilayer films

David L. Windt · Computers in Physics · 1998 · 908 citations · Full text

Optical Materials, Engineering, Microscopy +19

Density of amorphous Si

J. S. Custer, Michael O. Thompson, D. C. Jacobson et al. · Applied Physics Letters · 1994 · 279 citations

Materials Engineering, Materials Science, Amorphous Si +12

Nanometer interface and materials control for multilayer EUV-optical applications

E. Louis, Andrey Yakshin, T. Tsarfati et al. · Progress in Surface Science · 2011 · 152 citations

Materials Science, Optical Materials, Engineering +7

Synthesis and Structure of Isolated Silicon Clusters of Nine Atoms

Virginie Quéneau, Evgeny Todorov, Slavi C. Sevov · Journal of the American Chemical Society · 1998 · 131 citations

Cluster Science, Chemical Engineering, Engineering +12