Concepedia

Processing of AC-coupled n-in-p pixel detectors on MCz silicon using atomic layer deposited aluminium oxide

J. Ott, A. Gädda, S. Bharthuar, E. Brücken, M. Golovleva, J. Härkönen, M. Kalliokoski, A. Karadzhinova-Ferrer, S. Kirschenmann, V. Litichevskyi,

Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment · 2019 · 10 citations · 21 references

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21

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Riikka L. Puurunen · Journal of Applied Physics · 2005 · 2.6K citations

, , +17

Atomic layer deposition (ALD): from precursors to thin film structures

Markku Leskelä, Mikko Ritala · Thin Solid Films · 2002 · 1.3K citations

, , +14

Radiation Effects in MOS Oxides

James R. Schwank, M.R. Shaneyfelt, Daniel M. Fleetwood et al. · IEEE Transactions on Nuclear Science · 2008 · 935 citations

, , +17

Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology

Werner Kern · Medical Entomology and Zoology · 1970 · 820 citations

, , +14

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

G. Dingemans, W. M. M. Kessels · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 787 citations · Full text

, , +17