Deposition and microhardness of SiC from the Si2Cl6-C3H8-H2-Ar system

Chemical Vapor Deposition of Single Crystalline β ‐ SiC Films on Silicon Substrate with Sputtered SiC Intermediate Layer

Shigehiro Nishino, Y. Hazuki, Hiroyuki Matsunami et al. · Journal of The Electrochemical Society · 1980 · 180 citations

Natural Sciences, Materials Engineering, Materials Science +17

The structure of chemical vapor deposited silicon carbide

Jia Min Chin, P. Gantzel, Robert Hudson · Thin Solid Films · 1977 · 158 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +13

Reactive plasma deposited SixCyHz films

Y. Catherine, G. Turban · Thin Solid Films · 1979 · 119 citations

Natural Sciences, Materials Science, Physics +10

Thermodynamic Calculations for the Chemical Vapor Deposition of Silicon Nitride

Angus I. Kingon, LEONARD J. LUTZ, R. F. Davis · Journal of the American Ceramic Society · 1983 · 109 citations

Engineering, Materials Engineering, Materials Science +15

Thermodynamic Calculations for the Chemical Vapor Deposition of Silicon Carbide

Angus I. Kingon, LEONARD J. LUTZ, Peter K. Liaw et al. · Journal of the American Ceramic Society · 1983 · 93 citations

Natural Sciences, Materials Engineering, Materials Science +17