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Improved Structural and Chemical Properties of Nearly Lattice-Matched Ternary and Quaternary Barriers for GaN-Based HEMTs
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Citations
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References
2011
Year
Materials EngineeringMaterials ScienceElectrical EngineeringAluminium NitrideEngineeringWide-bandgap SemiconductorNanoelectronicsChemical PropertiesApplied PhysicsSingle-phase Barrier LayersAluminum Gallium NitrideGan Power DeviceGan/sic TemplatesBarrier MaterialsMicroelectronicsQuaternary BarriersCategoryiii-v SemiconductorNearly Lattice-matched Ternary
A complete structural and compositional study was carried out for a series of GaN-based lattice-matched HEMT structures. As barrier materials pseudomorphic to GaN, both ternary InAlN and quaternary InAlGaN were investigated. Growths were performed using molecular beam epitaxy on GaN/sapphire or GaN/SiC templates. An abrupt triple-layer AlN/GaN/AlN nanothin spacer at the interface is crucial to improve the structural and electrical properties of the heterostructures. In all cases, this resulted in single-crystalline and single-phase barrier layers.
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