2015 · 67 citations · 15 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsIii-v SemiconductorsSemiconductor HeterostructuresSemiconductor PhysicsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsCurrent DensityGallium NitrideGallium Nitride (Gan) MaterialsGallium Nitride Power DevicesGallium Nitride Power ElectronicsJunction Leakage CurrentLeakage CurrentP-n Junction Characteristics
We report GaN p-n diodes on free-standing GaN substrates: a record high Baliga's figure-of-merit (V<;sub>B<;/sub><;sup>2<;/sup>/ Ron) of 12.8 GW/cm<;sup>2<;/sup> is achieved with a 32 μm drift layer and a diode diameter of 107 μm exhibiting a BV > 3.4 kV and a R<;sub>on<;/sub> <; 1 mΩ-cm<;sup>2<;/sup>. The leakage current density is low: 10<;sup>-3<;/sup> - 10<;sup>-4<;/sup> A/cm<;sup>2<;/sup> at 3 kV. A record low ideality factor of 1.1-1.3 is signature of high GaN quality. These are among the best-reported GaN p-n diodes.
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InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts and $f_{T}$ of 370 GHz
Yuanzheng Yue, Zongyang Hu, Jia Guo et al. · IEEE Electron Device Letters · 2012 · 336 citations
1.9-kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon
Mingda Zhu, Bo Song, Meng Qi et al. · IEEE Electron Device Letters · 2015 · 184 citations · Full text