Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu - Concepedia

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Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu

46

Citations

32

References

2015

Year

Yujin Jang, Jun Beom Kim, Tae Eun Hong, So Jeong Yeo, Sun-Ju Lee, Eun Ae Jung, Bo Keun Park, Taek‐Mo Chung, Chang Gyoun Kim, Do-Joong Lee,

Journal of Alloys and Compounds

Materials ScienceEngineeringNanomaterialsNanotechnologyApplied PhysicsSemiconductor MaterialThin FilmsLayered MaterialNanocrystalline MaterialAtomic Layer DepositionHighly-conformal Nanocrystalline Molybdenum

References

	Year	Citations

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