IEEE Electron Device Letters · 1997 · 74 citations · 4 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDopingHigh-temperature MaterialsSemiconductor DefectsSemiconductor Device MaterialsSemiconductor PhysicsThermal Properties Of SemiconductorsHigh-temperature Device OperationHigh-temperature ElectronicsSchottky BarriersSchottky ContactsSchottky DefectsSeries ResistanceThermal ActivationThermionic Emission
For the first time, the operating temperature of a Schottky diode structure has been pushed to 1000/spl deg/C. The diode structure consists of a Si-based Schottky material deposited onto a homoepitaxial boron doped diamond surface. At high temperatures, the forward I-V characteristics are dominated by the thermionic emission (n/spl ap/1.01) across a barrier of 1.9 eV height. The reverse characteristics are still dominated by thermally activated defects. The series resistance shows thermal activation associated with the boron doping.
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High-voltage Schottky diode on epitaxial diamond layer
Wolfgang Ebert, Andrei Vescan, P. Gluche et al. · Diamond and Related Materials · 1997 · 48 citations